Euv Lithography

极短紫外光光刻技术

电子技术

售   价:
1042.00
作      者
出  版 社
出版时间
2008年12月10日
装      帧
精装
ISBN
9780470471555
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页      码
702
语      种
英文
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图书简介
This is an edited volume with contributions of he world’s leading extreme ultraviolet lithography (EUVL) researchers. The Editor has led research into EUVL at Sematech Inc and is currently the president of EUVL Inc. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology.
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