Thin Films, Atomic Layer Deposition, and 3D Printing

薄膜、原子层沉积与3D打印:揭秘工业4.0的概念及其相关性

纺织科学技术基础学科

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作      者
出  版 社
出版时间
2023年11月29日
装      帧
精装
ISBN
9781032416953
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页      码
272
开      本
234 x 156 mm (6.14 x 9.21
语      种
英文
版      次
1
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库存 30 本
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图书简介
It explains concept of thin films, atomic layers deposition, and the fourth industrial revolution (4IR) with aim to illustrate existing resources and gives a broader spectrum involved processes, provide a selection of difference types of 3D printing, materials used for 3D printing, emerging trends and applications, and current top-performing 3D printers using different technologies. It covers the concept of the 4IR and its role in current and future human endeavour for both experts/non-experts. The book includes figures, diagrams, and their application in real-life situations.Features:Provides comprehensive material on conventional and emerging thin film, atomic layer,and additive technologies.Discusses the concept of Industry 4.0 in thin films technology.Details the preparation and properties of hybrid and scalable (ultra) thin materials for advanced applications.Explores detailed bibliometric analyses on pertinent applications.Interconnects atomic layer deposition and additive manufacturing.This book is aimed at researchers and graduate students in mechanical, materials and metallurgical engineering.
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