Polymers in Microlithography: An Overview; Br\"onsted Acid Generation from Triphenylsulfonium Salts in Acid-Catalyzed Photoresist Films; Chemically Amplified Resist: Effect of Polymer and Acid Generator Structure; Copolymer Approach to Design of Sensitive Deep-UV Resist Systems with High Thermal Stability and Dry Etch Resistance; Nonswelling Negative Resists Incorporating Chemical Amplification: Electrophilic Aromatic Substitution Approach; Acid-Catalyzed Cross-Linking in Phenolic-Resin-Based Negative Resists; New Design for Self-Developing Imaging Systems Based on Thermally Labile Polyformals; Polysilanes: Solution Photochemistry and Deep-UV Lithography; Syntheses of Base-Soluble Si Polymers and Their Application to Resists; Lithographic Evaluation of Phenolic Resin-Dimethyl Soloxane Block Copolymers; Preparation of a Novel Silicone-Based Positive Photoresist and Its Application to an Image Reversal Process; Photooxidation of Polymers: Application to Dry-Developed Single-Layer Deep-UV Resists; Kinetics of Polymer Etching in an Oxygen Glow Discharge; Quantitative Analysis of a Laser Interferometer Waveform Obtained During Oxygen Reactive-Ion Etching of Thin Polymer Films; Evaluation of Several Organic Materials as Planarizing Layers for Lithographic and Etchback Processing; New Negative Deep-UV Resist for KrF Excimer Laser Lithography; Characterization of a Thiosulfate Funtionalized Polymer: A Water-Soluble Photosensitive Zwitterion; Pyrimidine Derivatives as Lithographic Materials; Synthesis of New Metal-Free Diazonium Salts and Their Applications to Microlithography; Photobleaching Chemistry of Polymers Containing Anthracenes; Lithography and Spectroscopy of Ultrathin Langmuir-Blodgett Polymer Films; Dissolution of Phenolic Resins and Their Blends; Solvent Concentration Profile of Poly(methyl methacrylate) Dissolving in Methyl Ethyl Ketone: A Fluorescence-Quenching Study; Molecular Studies on Laser Ablation Processes of Polymeric Materials by Time-Resolved Luminescence Spectroscopy; Mechanism of Polymer Photoablation Explored with a Quartz Crystal Microbalance; Mechanism of UV- and VUV-Induced Etching of Poly(methyl methacrylate): Evidence for an Energy-Dependent Reaction
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