X-Ray Metrology in Semiconductor Manufacturing

半导体制造X光度量法

光电子学与激光技术

售   价:
1971.00
发货周期:预计5-7周发货
出  版 社
出版时间
2006年01月24日
装      帧
精装
ISBN
9780849339288
复制
页      码
296
开      本
6-1/8 x 9-1/4
语      种
英文
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图书简介
Written by established world experts, X-Ray Metrology in Semiconductor Manufacturing describes the applications, science, and technology of this rapidly evolving area. This book emphasizes practical metrology, with real world examples from the semiconductor and magnetics industries. The authors discuss the techniques, theory, and applications of X-ray metrology in semiconductors and other advanced thin films. The book covers the essential metrological questions of precision and repeatability, absolute accuracy, spot size, and throughput for each type of measurement. This text contains important information for electrical engineers, fabrication engineers, and semiconductor engineers.
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